超细二氧化硅的制备和表征

Synthesis and Characterization of Ultrafine SiO_2

本文以正硅酸乙酯为硅源,通过溶胶-凝胶法制备超细二氧化硅。考察了溶剂、温度、添加剂等因素对制备二氧化硅的影响。通过一系列的实验确定了制备超细二氧化硅较好的工艺条件:以丙酮为溶剂、氨水为催化剂、pH值为9左右、反应温度为40℃。并采用XRD、N2等温吸附-脱附、FT-IR、SEM等手段对二氧化硅进行表征。结果表明:所制得的二氧化硅为无定形结构,孔径分布集中在2～25nm,BET比表面积可达200m2/g以上。

In this article, the synthesis and characterization of uhrafine SiO2 were briefly summarized. Uhrafine SiO2 were obtained by sol-gel process, using TEOS as source of silica. In this work, the influences of different solvents, various temperatures and additive on the synthesis of uhrafine SiO2 were discussed. N2 adsorption-desorption isotherms, XRD, FT-IR and some other experiment methods were used to investigate the structure and other physical properties of the samples. The results showed that the SiO2 are amorphous, the BJH pore size distribution of the samples are about 2 -25 nm, the BET specific surface areas of the samples are larger than 200 m^2/g.