硅片抛光雾的分析研究

The Analysis and Research About Silicon Wafer′s Polishing Fog

通过试验分析了抛光雾产生的机理和影响因素。在试验的基础上，优化选择了抛光工艺技术，有效地控制了抛光雾，取得较好的结果。

This paper analyses principles and influnce factors of polishing fog production and optimizes polishing technology on the basis of experiments,effectively control polishing fog and achieve better economical and social benefits.