制备工艺条件对纳米Ti_(1-x)S_xO_2薄膜光催化活性的影响

Effects of technological conditions for preparation of Ti_(1-x)S_xO_2 film on photocatalytic activity

以硫脲为S的源物质,以钛酸丁酯为TiO2的前驱体,以蜂窝陶瓷为载体,采用改进的溶胶-凝胶-浸渍提拉法制备Ti1-xSxO2薄膜,探讨热处理温度、S掺杂量及涂膜等工艺条件对Ti1-xSxO2薄膜的光催化活性的影响。研究结果表明:掺硫TiO2光催化剂在可见光区的吸收强度增大;采用溶胶-凝胶-浸渍提拉法制备Ti1-xSxO2光催化剂的最佳工艺条件是:硫脲与Ti(OBu)4摩尔比为3:1,煅烧温度为600℃,涂膜层数为6。在最佳工艺条件下制备的Ti1-xSxO2纳米薄膜对亚甲基蓝的降解率可达100%。

With thiourea as the source substance of S, with Titanium tetrabutoxide （Ti（OC4H9）4 as the precursor of titanium dioxide and with honeycomb ceramics as carriers, S-TiO2 films were prepared by a modified sol-gel-dipping process. Effects of the heat treating temperature, the amount of sulfur-doping and the technological conditions of coating films on the photocatalytic activity of Ti1-xSxO2 films were discussed. The results show that the adsorption activity of TiO2 photocatalysts with suitable sulfur-doping in visible light increases. The optimal technological conditions of Ti1-xSxO2 photocatalysts prepared by sol-gel-dipping process are as follows： The molar ratio of thiourea and titanium tetrabutoxide is 3：1, the calcinations temperature is 600 ℃ and the times of coating film is 6. The degradation of Ti1-xSxO2 nano-fihn prepared at the optical technological conditions for methylene blue may reach 100%.