期刊文献+

Sol-gel法制备Bi3.4Ce0.6Ti3O12铁电薄膜及其性能 被引量:1

原文传递
导出
摘要 采用Sol-gel法在Pt/Ti/SiO2/Si衬底上制备Bi3.4Ce0.6Ti3O12薄膜.利用X射线衍射仪和原子力显微镜对其微观结构进行了观察,发现制备的薄膜具有单一的钙钛矿晶格结构,而且表面平整致密.对Bi3.4Ce0.6Ti3O12薄膜的介电、铁电、疲劳和漏电流等性能进行了研究,结果表明:室温下,在测试频率1 kHz时,其介电常数为172,介电损耗为0.031;在测试电压为600 kV·cm-1,其剩余极化值2Pr达到了67.1μC·cm-2,具有较大的剩余极化值,矫顽场强2Ec也达到了299.7kV·cm-1;经过4.46×109次极化反转后,没有发生疲劳现象,表现出良好的抗疲劳特性;漏电流测试显示制备的Bi3.4Ce0.6Ti3O12薄膜具有良好的绝缘性能.
出处 《中国科学(E辑)》 CSCD 北大核心 2008年第3期442-447,共6页 Science in China(Series E)
基金 湖北省自然科学基金资助项目(批准号:2004ABA082)
  • 相关文献

参考文献11

  • 1Li W, Chen A P, Lu X M, et al. Priority of domain wall pinning during the fatigue period in bismuth titanate ferroelectric thin films. Appl Phys Lett, 2005, 86:192908
  • 2Yamaguchi M, Nagatomo T. Preparation and properties of Bi4Ti3O12 thin films grown at low substrate temperatures. Thin Solid Films, 1999, 348:294-298
  • 3Park B H, Kang B S, Bu S D, et al. Lanthanum-substituted bismuth titanate for use in non-volatile memories. Nature, 1999, 401:682-684
  • 4Shimakawa Y, Kubo Y, Tauchi Y, et al. Crystal and electronic structures of Bi4-xLaxTi3O12 ferroelectric materials. Appl Phys Lett, 2001, 79:2791-2793
  • 5Maiwa H, Iizawa N, Togawa D, et al. Electromechanical properties of Nd-doped Bi4Ti3O12 films: A candidate for lead-free thin-film piezoelectrics. Appl Phys Lett, 2003, 82:1760-1762
  • 6Chon U, Shim J s, Jang H M. Ferroelectric properties and crystal structure of praseodymium-modified bismuth titanate. J Appl Phys, 2003, 93:4769-4775
  • 7Chen M, Liu Z L, Wang Y, et al. Ferroelectric properties and microstructures of Sm-doped Bi4Ti3O12 ceramics. Phys B, 2004, 352:61-65
  • 8郭冬云,王耘波,于军,高俊雄,李美亚.La掺杂对Bi_4Ti_3O_(12)薄膜铁电性能的影响[J].物理学报,2006,55(10):5551-5554. 被引量:13
  • 9Scott J F.Ferroelectric Memories.第一版.朱劲松,译.北京:清华大学出版社,2004.195-199
  • 10Kim K T, Kim C I, Kang D H, et al. Large remanent polarization of cerium-modified bismuth-titanate thin films for ferroelectric random access memories. J Vac Sci Technol A, 2003, 21:1376-1380

二级参考文献9

  • 1James F,Scott,Carlos A.Paz de Araujo 1989 Science 246 1400
  • 2Kohlstedt H,Mustafa Y,Gerber A et al 2005 Microelectronic Engineering 80 296
  • 3Fang P H,Robbins C R,Aurivillius B 1962 Phys.Rev.126 892
  • 4Joshi P C,Krupanidhi S B 1993 Appl.Phys.Lett.62 1928
  • 5Park B H,Kang B S,Bu S D et al 1999 Nature 401 682
  • 6Guo D Y,Wang Y B,Yu J,GAO J X 2005 Journal of Wuhan University of Technology-Materials Science 20 20
  • 7Shimakawa Y,Kubo Y,Tauchi Y et al 2001 Appl.Phys.Lett.79 2791
  • 8Yau C Y,Palan R,Tran K et al.2005 Appl.Phys.Lett.86 32907-1
  • 9王华.Si基Bi_4Ti_3O_(12)铁电薄膜的制备与特性研究[J].物理学报,2004,53(4):1265-1270. 被引量:14

共引文献12

同被引文献14

引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部