大幅面光刻胶板的显影工艺与终点控制技术

End-point Control and Development Process Techniques for Large Format Photoresist Plate

为了均匀显影大幅面激光全息光刻胶板,获得最佳衍射效果,使用自动喷淋显影工艺技术。文章讨论了显影方法及工艺对显影槽深均匀性的影响,包括激光的曝光能量,显影药液的浓度、温度、时间及胶板入液先后时间。通过多种显影方法比较,自动喷淋显影可以克服人工显影操作引起的时间、平稳性误差导致大幅面全息光刻胶母版显影不均匀、光栅槽型、终点控制和重复性差等缺陷,获得最佳显影效果。

To obtain optimized diffractive efficiency for uniform development process of Large Format Pnotoresist t-tare wnne automatically spray development are used. The paper discuss development methods and techniques effect on grating groves uniform appearance of photoresist plate, include of exposure energy, concentration of developer solution, temperature, duration, different time when photoresist plate has been side by side immersion. Compare variety of development methods an automatic developing process will be enhanced photoresist.