类金刚石薄膜的激光损伤特性及工艺优化

Laser Damage Properties and Process Optimization of Diamond-like Carbon Thin Films

采用脉冲真空电弧沉积(PVAD)技术制备了类金刚石(DLC)薄膜,并对其抗激光损伤特性进行了研究,优化了制备工艺。对DLC薄膜激光损伤阈值(LIDT)的测试结果表明,随着厚度的增加,薄膜的LIDT开始呈下降趋势,当厚度达到100nm以上时,则趋于一个稳定值。正交实验结果的处理和分析表明,在所给定的工艺参数范围内,主回路电压是影响DLC膜抗激光损伤性能的最主要因素,基片温度、清洗时间和脉冲频率则影响较小。为得到较好的抗激光损伤能力,采用PVAD技术制备DLC薄膜的最佳工艺参数为:清洗时间20min、基片温度150℃、脉冲频率5Hz、主回路电压150V。退火处理会使DLC薄膜的激光损伤阈值明显提高。

The Diamond-like Carbon （DLC） fills were prepared by Pulse Vacuum Arc Deposition （PVAD） technique, the Laser-induced Damage Threshold （LIDT） of these films was investigated, and the preparation process was optimized. The results indicate that with the increase of the film thickness, the LIDT decreases firstly and then become stable above 100 nm. The study and analysis to orthogonal experiment results reveal that compared with other experiment parameters such as substrate temperature, cleaning time and pulse frequency in the experiment range, the main voltage is the most important factor to affect the laser-induced damage resistance of DLC films. An optimization process was obtained in the study at the cleaning time of 20 min, substrate temperature of 150℃, pulse frequency of 5 Hz and main voltage of 150 V. The LIDT of the DLC fills can be improved by annealing in some degree.