摘要
采用直流磁控溅射ZAO陶瓷靶的工艺,在玻璃衬底上成功地镀制了ZAO透明半导体膜,获得了电阻率6×10-4Ωcm和可见光透过率85%以上的ZAO薄膜最佳光电特性参数.
ZAO transparent semiconductive films were deposited onto the glass substrated by DC magnetron sputtering method. The experimental results show that the perfect electrical and optical parameters of the thin films with resistivity 6×10^-4Ωcm and visible light transmissivity beyond 85% were obtained.
出处
《河南教育学院学报（自然科学版）》
2008年第4期18-19,共2页
Journal of Henan Institute of Education(Natural Science Edition)
关键词
磁控溅射
ZAO膜
电阻率
透光率
magnetron sputtering
ZAO film
resistivity
transmissivity
