流动注射-氢化物发生-等离子体原子发射光谱法同时测定电解铜中痕量砷、锑、铋的研究

Study on Simultaneous Determination of Trace Arsenic、Antimony and Bismuth in electrolytic copper Sample by Flow Injection Hydride Generation Coupled with Inductively Coupled Plasma Atomic Emission Spectrometry(FI HG ICP AES)

介绍了流动注射（ＦＩ）－氢化物发生（ＨＧ）与等离子体原子发射光谱（ＩＣＰ－ＡＥＳ）联用技术以及应用于电解铜中痕量砷、锑、铋测定的研究，本法的ＲＳＤ对砷、锑、铋分别为２．３、１．８、２．８％（ｎ＝１１），方法的检出限分别为０．３、０．３、１．１５μｇ／ｇ。

The technique of flow injection hydride generation coupled with ICP AES and its application on determining trace As,Sb and Bi in electrolytic copper was investigated.An effective method was established ,the RSD for determination of As,Sb,Bi was 2.3,1.8,2.8%( n =11),and the detection limit was 0.3,0.3,1.15μg/g respectively.