In^(3+)与Ga^(3+)对纯铝在KOH溶液中电化学行为的影响

Influences of In^(3+)and Ga^(3+) on the Electrochemical Behaviour of Al in KOH Solution

通过极化曲线、交流阻抗的方法研究了纯给在1mol·L－1KOH溶液中的电化学行为，分析了铝在碱性介质中活性溶解时的特殊动力学现象．通过溶液中添加金属离子In3十和Ga3＋，研究了高析氢过电位金属离子对纯铝在KOH溶液中阳极溶解过程的影响机制，并结合扫描电镜照片（SEM）证明了In3十和Ga3十对铝电极溶解的影响过程．

Electrochemical Behaviors of Al in 1 mol·L-1 KOH solution without and with the addition of In3+or Ga3+ were investigated with potentiodynamic polarization and Eis techniques,Corrosion rates were measured by volumes of hydrogen evolved. The results show that though indiu, and gallium are the metals with high H2-evolution voltage,addition of In3+retards both anodic and cathodic reaction of the corrosion of Al in KOH solution and thus inhibits the corrosion.while Ga3+ accelerates the anodic dissolution process as well as the corrosion of Al in the solution. SEM verified the above results.