氟化非晶碳膜的微结构分析

Growth and Properties of Fluorinated Amorphous Carbon Films

利用等离子体增强化学气相沉积(PECVD)法,在不同的温度下制备了氟化非晶碳膜。采用原子力显微镜(AFM)、X射线光电子能谱(XPS)和傅里叶红外吸收光谱(FTIR)等仪器对薄膜微结构进行了表征。研究发现,氟化非晶碳膜微观结构与薄膜生长过程温度控制密切相关,温度升高,膜内键合结构变化,sp2相对含量增加。

The fluorinated amorphous carbon （a-C ： F） thin films were grown by RF plasma enhanced chemical vapor deposition （RF-PECVD）. The a-C：F thin films were characterized with atomic force microscopy （AFM）, X-ray photoelectron spectroscopy （XPS） and Fourier transform infrared spectroscopy （PTIR）. The influence of the film growth conditions on micmstructures and properties of the a-C ： F films was studied. The results show that the substrate temperature strongly affects the micmstmetures of a-C：F films. As the substrate temperature increases, the structures of chemical bond changes and the relative density of sp^2 in the film increases.