摘要
采用三种巯基化合物作为含乙烯基聚硅氮烷(PSN-1)的光固化剂,研究了三种巯基化合物与PSN-1的反应动力学,并对光固化产物进行了热重分析。结果表明:巯基化合物/PSN-1体系的反应速率与巯基浓度的一次方成正比,与乙烯基浓度无关,均为一级反应;四元巯基化合物比二元巯基化合物的初始反应速率快,而转化率偏低;四巯基季戊烷/PSN-1体系的陶瓷产率高达89%,更适合作先驱体转化法制备陶瓷材料的陶瓷先驱体。
Three types of thiol-ene compounds were used as photopolymerzation crosslinker for vinyl-polysilazane (PSN--1). The reaction kinetics were studied between these three types of thiol-ene compounds and PSN--1, and thermogravimetric analysis (TGA) was carried out on the light-cured products. The results showed that reaction of thiol-ene compounds/PSN--1 was an first order reaction with the reaction rate directly proportional to the concentration of thiol-ene but not affected by with the concentration of the vinyl. The initial reaction rate of quaternary thiol-ene compounds was faster than that of bithiol-ene compounds, while the conversions was lower; the ceramic yield of 2,2-- bis(mercaptomethyl) -- 1,3-- propanedithiol/PSN-- 1 precursor was 89 % , which was more suitable to preparing ceramics.
出处
《有机硅材料》
CAS
2009年第1期17-22,共6页
Silicone Material
关键词
巯基化合物
四巯基季戊烷
乙烯基聚硅氮烷
陶瓷先驱体
陶瓷产率
thiol-ene compound, quaternary thiol-ene pentane, vinyl polysilazane, ceramic precursor, ceramic yield.