摘要
介绍了欧姆接触中运用能带工程的原理,评述了近年来GaAs欧姆接触中能带工程应用的研究状况。具体分析了用薄的窄能隙材料做帽层降低势垒高度和基于In金属化系统的欧姆接触两方面的应用。
The design concept of energy band engineering is introduced into GaAs ohmic contact.Specifically,the reduction of barrier height by using thin and narrow energy gap material as cap layer is described,as well as the application of ohmic contacts based on In metallization system.Also,the recent progress in energy band engineering for GaAs ohmic contact is reviewed.
出处
《微电子学》
CAS
CSCD
北大核心
1998年第1期28-31,共4页
Microelectronics
基金
北京市科委科技新星计划基金
北京工业大学211基金
关键词
欧姆接触
能带工程
砷化镓
Semiconductor physics,GaAs,Ohmic contact,Energy band engineering