摘要
本文报道了用MBE-SPM联合系统对InAs/GaAs量子点进行准原位研究的初步结果.STM图像表明,在对n+-GaAs衬底进行脱氧处理后,通过生长GaAs缓冲层能有效的改善表面质量.在缓冲层上继续生长2单原子层InAs后形成了量子点.SPM与透射电子显微镜给出的量子点形貌的异同在文中也给出了合理的解释,该研究工作的进一步深入将对自组织生长量子点的生长机理的理解和样品质量的提高有重要意义.
Abstract We present our preliminary results of in situ scanning tunneling microscope investigations on InAs/GaAs self organized quantum dots with our MBE SPM combined system. STM images show that, after the deoxidization process on n + GaAs substrate, growing GaAs buffer can effectively improve the surface quality. After growing 2 monolayers InAs on the buffer, quantum dots will be formed. We also give reasonable explanations about the differences between the results given by the STM and TEM measurements. Further research in this field will help us to understand the growth mechanism of the self organized quantum dots and to make good quality sample.
基金
国家自然科学基金
国家攀登计划