摘要
磁控溅射技术因具有溅射速率高、无污染、可制备各种不同功能的薄膜等优点而得到广泛地应用。综述了薄膜附着力机理,分析了影响薄膜性能的因素,结果表明,薄膜的附着力是影响薄膜性能的主要因素。影响薄膜附着力的因素有:基材的表面清洁度、制备薄膜的各种工艺参数、热处理、原料的纯度等。
Magnetron sputtering technology has a lot of advantages, such as high rate of sputtering and non-polluting, it can be used in preparing kinds of films with a variety of performance. Film adhesion is one of the important factors that influences film properties. In this paper, the mechanism of film adhesion and its influence factor were summarized, which can provide a reference for improving adhesion of films.
出处
《绝缘材料》
CAS
2008年第6期41-43,46,共4页
Insulating Materials
基金
国防基础科研(B0920061337)
关键词
磁控溅射
附着力
综述
magnetron sputtering
adhesion
review
