非均匀基底薄膜生长的Monte Carlo模拟研究

Study of thin film growth by Monte Carlo simulation on heterogeneous substrate

利用Monte Carlo方法对薄膜生长过程进行了计算机模拟,研究了在有缺陷的基底下,沉积粒子的能量和入射率对薄膜生长的影响.通过模拟发现,随着沉积粒子的能量提高或入射率的降低,沉积在基底上的粒子逐步由各自独立的离散型分布向聚集状态转变形成岛核.分析表明,这些变化是由于能量粒子的介入使得表面粒子的扩散能力增强,而入射率越小,每一步中对应粒子的扩散时间就越长,所以大量粒子能够充分扩散.

A Monte Carlo technique has been developed for simulating growth of thin films. The effect of energy deposition particles and deposition rate on the thin film growth is studied on the defect substrates. The results showed that as energy deposition particles is raised or the deposition rate decreased, the diffusion of particles causes the particles grouping into islands （ more than three atoms ） . Analysis Indicate that diffusivity will inerease with energy deposition particles increasing, diffusion time will increase with deposited rate decreasing, so a great deal particles can diffuse adequately.