电子回旋共振等离子分解CH_(19)Si_2N制备SICNB膜XPS分析

XPS ANALYSIS OF SICNB FILM SYNTHESIZED BY ELECTRON CYCLOTRON RESONANCE PLASMA DECOMPOSITION CH 19 Si 2N-N 2

电子回旋共振等离子分解ＣＨ１９Ｓｉ２Ｎ－Ｎ２混合气体，采用溅射共混、气相液相共混沉积技术，制备四元素ＳｉＣＮＢ膜，由ＸＰＳ分析了膜的成份及生成的键结构，发现溅射共混、气液共混沉积过程中聚合成了Ｃ－Ｎ、Ｃ－Ｂ、Ｎ－Ｂ、Ｓｉ－Ｃ化合物。

The paper report formation of four elements SiCNB film by electron cyclotron resonance plasma decomposed CH 19 Si 2N-N 2hybrid gas assisted sputter Co-mixing and gas-liquid phase Co-mixing technology. composition and chemical bond of film were analysized by XPS. Expriment showed that formation of Si-c, C-B, C-N, B-N vond as well as Bc 2N structure in the films at sputter Co-mixing and gas-liquid phase Co-miximg.