低温热处理CoN/CN软X射线多层膜的界面互扩散研究

INTERDIFFUSION IN LOW TEMPERATURE ANNEALED CoN/CN SOFT X-RAY MULTILAYER MIRRORS

在473—523K的低温退火条件下，通过对CoN／CN软X射线多层膜一级调制峰强度增强的定量观测，研究了CoN／CN软X射线多层膜的界面互扩散行为，并测得低至10-25m2s-1的有效扩散系数通过和Co/C多层膜的结果相比较，发现N掺杂使CoN／CN软X射线多层膜的界面互扩散行为明显不同于Co／C多层膜，并具有如下特点：（1）有效扩散系数和宏观扩散系数较小；（2）扩散激活能较大；（3）临界波长相等Co—N，C—N之间存在的强化学键以及N原子的填隙，减小了结构弛豫和界面扩散这表明通过N掺杂有希望改善Co／C软X射线多层膜的结构热稳定性.

The interdiffusion in the amorphous CoN/CN soft X-ray multilayer is investigated quantitatively by monitoring the enhancement of the first order modulation peak onannealing in the temperature range of 473-523 K. The effective interdiffusion coefficient measured is as low as 10-25m2s-1. The comparison with the results of Co/C system indicates that the following three features are noticeable: (1) the critical wavelengths of interdiffusion obtained are 2.00-2.04 nm at temperatures ranging from 473 to 523 K and equal to those of Co/C multilayers within the experimental error, indicating that the interdiffosion behaviour in the CoN/CNmultilayers still depends on the thermodynamic properties of the Co--C system, (2) the effectiveinterdffesivities and macroscopic diffusion coefficiellts are lower, and (3) the activation energy ofdiction is higher. The results imply that it is possible to improve the thermal stability of Co/Cmultilayer by doping with nitrogen.