ZnO薄膜中缓冲层厚度的研究

Research on the Thickness of the Buffer Layer in ZnO Thin Films

采用溶胶-凝胶法制备ZnO缓冲层,并在其上沉积ZnO薄膜。研究了匀胶的膜厚控制公式,达到对膜厚的控制。采用X射线衍射仪和原子力显微镜分析了缓冲层厚度对ZnO薄膜结晶质量和表面形貌的影响规律。

Sol-Gel for the buffer layer is introduced, and ZnO thin films were deposited on the buffer layer. By the research on the formula of the layer thickness, the control of layer thickness can be achieved. The crystalline quality and morphology of ZnO thin film had been systematically investigated by means of X-Ray Diffraction（XRD） and Atomic Force Microscopy（AFM）.