面向微加工的虚拟光刻系统建模与实现

Modeling and implementation of a virtual lithography system for micromachines

提出了一种面向微加工的虚拟光刻系统Litho3D。该系统采用傅立叶光学成像模型、光刻胶曝光及显影模型,实现了投影式光学光刻的三维模拟。它拥有标准的GDSII、CIF版图格式接口和支持各种光学参数(包括数值孔径、波长、离焦量,光刻胶厚度、表面折射率等)的模拟设置。模拟结果的显示采用了体绘制与网格相结合的方法,增强了结果的可视性。此外,光刻模拟结果可以直接导入到虚拟工艺系统ZProcess中作为刻蚀工艺的掩膜输入,实现了光刻工艺与其他微机电系统(MEMS)工艺模拟的无缝集成。一系列模拟结果验证了该系统的可行性。

This paper proposes the Litho3D, a virtual lithography system for micromachines. The system utilizes a Fourier optics imaging model, a photoresist exposuring model, and a development model to simulate the projective optical lithography. Also, the system supports the input of GDSII and CIF format layout, and permits the interactive configuration of simulation parameters, including numerical aperture, wavelength, defocus, photoresist thickness, and surface reflection. The visualization of simulated results is based on the method of combining volume rendering with mesh rendering, which enhances the visibility. Additionally, the simulated results can be directly used as the masks of the etching process in the virtual process system, which implements the integrated simulation between lithography and other MEMS fabrication processes. A series of simulation results demonstrate the feasibility of the system.