VO_2薄膜的制备及表征

Preparation and characterization technology of vanadium dioxide film

综述了目前VO2薄膜主要的制备方法(sol-gel法,蒸发法,脉冲激光沉积,溅射法和CVD)及其优缺点;以及X射线技术、光电子能谱、光谱技术、显微技术等表征手段在VO2薄膜研究中的应用。如何方便地获得准确化学计量的VO2,获得结晶性好的薄膜结构以及与基体间具有良好结合力的制备方法,是今后关注的问题。

Introduced was the preparing mehod of VO2 thin film including sol-gel method, evaporation method, PLD, sputtering method and CVD. Advantage and shortcoming of these methods were also discussed. The structure and properties of the VO2 thin films were characterized by X-ray analysis techniques, photoelectric spectroscopy techniques, spectral analysis techniques and micro-spectroscopy analysis. It remains to be further question that the preparation methods for easily and accurately obtaining the VO2 of stoichiometry, film with good crystalline as well as better binding strength between film and matrix are deueloped.