用反应离子刻蚀技术制作Ge菲涅尔微透镜列阵

MAKE OF Ge FRESNEL MICROLENS ARRAYS USING REACTION ION ETCHING TECHNOLOGY

研究了用反应离子刻蚀技术制作Ｇｅ材料微透镜列阵的工艺过程及影响透镜列阵质量的因素，总结出“小功率、中气流、掺氧气”的优化工艺特点，制作出衍射效率高于８５％的八台阶Ｇｅ材料菲涅尔微透镜列阵．

This paper studies the technical process of using reaction ion etching(RIE) technique to fabricate Ge material microlens arrays,and the factors of affecting the microlens′ quality in the process.The technology characteristics of low working power,middle gas flow and mixing O2 are summarized,and an eightstage Fresnel microlens array with diffraction efficiency more than 85% is fabricated.