摘要
针对光刻用准分子激光器的激励技术,利用拉普拉斯变换方程对脉冲变压器高压充电过程进行了分析,验证了耦合系数于与压缩高压充电时间的重要作用。耦合系数越接近于1,高压充电时间越短。介绍了充电电路与磁开关结合后完成快放电的过程,并提出了一种控制谐振充电的方法。实现了对高压电容50μs内的快充电。
Based on the exciting technology of excimer laser used for semiconductor lithography, the charging process of pulse transformer is analyzed using the Laplace formula. It is validated that the coupling factor influences the charging time. The charging time is compressed when the coupling factor is close to 1. The discharge process of charging circuit combined with magnetic switches is introduced. A scheme for controlling the resonant charging is also proposed. The power supply designed can fulfill the charge process in 50μs.
出处
《量子电子学报》
CAS
CSCD
北大核心
2009年第1期39-43,共5页
Chinese Journal of Quantum Electronics
关键词
激光技术
脉冲升压式电源
拉普拉斯变换
高重复率
光刻
laser techniques
pulse charging power supply
Laplace transformation
high-repetition
semiconductor lithography
