摘要
介绍了射频磁控溅射金属Ti膜工艺,对Ti膜光吸收特性进行了测试,用经典电子理论分析了光吸收机理。
The technique of RF magnetic control sputtering metallic Ti film has been introduced in this paper. Measurements have been carried out on Ti film optical absorption charateristics and the optical absorption mechanism has been analyzed with the classical electronic theory.
出处
《光通信研究》
北大核心
1998年第1期46-49,共4页
Study on Optical Communications
关键词
磁控溅射
金属吸收膜
光吸收
钛
半导体薄膜技术
magnetic control sputtering, metallic absorption film, optical absorption
