摘要
构造了考虑栅结漏电流影响的平面肖特基二极管电容计算模型,并用此模型对同一结构不同漏电流的肖特基二极管作了计算分析。计算结果显示,所构造模型与实验结果符合得很好,同时揭示出栅结漏电流对C—V特性确有影响。这种影响表现为,在一定的栅压范围内,随着栅结漏电流的增大,C—V曲线明显上抬。文中还与其它未考虑栅结漏电流影响的模型作了对比。
A model for capacitance calculation is presented,in which the effects of gate contact leakage current is taken into account.Schottky diodes with the same structure but different leakages are analyzed with this model.It has been shown that the model proposed is in good agreement with the experimental results.It reveals that the leakage current does have effects on the C—V characteristics of Schottky diodes
出处
《微电子学》
CAS
CSCD
北大核心
1998年第2期103-106,共4页
Microelectronics
基金
国家自然科学基金
关键词
砷化镓
微波集成电路
肖特基二极管
MMIC
GaAs, MMIC, Schottky diode, Gate contact leakage, C—V characteristics