摘要
In this paper, five factors, namely the HF （hydrofluoric acid） concentration, field strength, illumination intensity as well as the oxidizing-power and conductivity of electrolytes were found to strongly affect the fast pore etching. The oxidizing power of aqueous HF electrolyte of different concentrations was especially measured and analysed. A positive correlation between optimal bias and HF concentration was generally observed and the relationship was semiquantitatively interpreted. Pore density notably increased with enhanced HF-concentration or bias even on patterned substrates where 2D （two-dimensional） nuclei were densely pre-textured. The etch rate can reach 400μm/h and the aspect ratio of pores can be readily driven up to 250.
In this paper, five factors, namely the HF （hydrofluoric acid） concentration, field strength, illumination intensity as well as the oxidizing-power and conductivity of electrolytes were found to strongly affect the fast pore etching. The oxidizing power of aqueous HF electrolyte of different concentrations was especially measured and analysed. A positive correlation between optimal bias and HF concentration was generally observed and the relationship was semiquantitatively interpreted. Pore density notably increased with enhanced HF-concentration or bias even on patterned substrates where 2D （two-dimensional） nuclei were densely pre-textured. The etch rate can reach 400μm/h and the aspect ratio of pores can be readily driven up to 250.
基金
supported by Chinese National ‘863’ Project (Grant No 2006AA04Z312)
‘973’ Project (Grant No 2006CB300403)
the National Natural Science Foundation of China (Grant No 60772030)
