摘要
采用射频磁控溅射方法在熔石英玻璃衬底上制备了ZnO薄膜.薄膜的X射线衍射(XRD)分析表明样品具有较好的结晶性和良好的c轴取向.光致发光(PL)性能分析发现,分别在398 nm和470 nm波长出现了较强的发光峰,与ZnO薄膜通常的发光峰位置明显不同.通过分析表明,398 nm波长的发光峰是由于导带电子跃迁到Zn空位引起,470 nm波长的发光峰是由于间隙Zn电子跃迁到Zn空位上而产生.
ZnO films were prepared on fused silica substrates by radio frequency magnetron sputtering method. XRD measurements showed better crystalline and highly c -axis oriented. The photoluminescence spectrum showed two emission peaks locating at wavelength of 398 nm and 470 nm which were not consistent with the typical position of emission peak, demonstrating that the emission peak at 398 nm can be attributed to the electron transitions from the conduction band to Zn vacancies levels, and the emission peak at 470 nm can be attributed to the electron transitions from intestinal Zn levels to Zn vacancies levels.
出处
《辽宁大学学报(自然科学版)》
CAS
2009年第1期6-8,共3页
Journal of Liaoning University:Natural Sciences Edition
基金
辽宁省教育厅科研计划(2008224)
辽宁省科技厅科研计划(20081030)