立方氮化硼薄膜的最新研究进展

Recent progress in cubic boron nitride film synthesis

立方氮化硼(cBN)作为一种在自然界中并不存在的人造材料具有优异的理化特性.在超硬刀具、高温电子器件和光学保护膜等领域有着广泛的应用前景,已经成为材料科学的研究热点之一.但是气相生长高质量cBN薄膜仍然还有许多难点需要攻克.在综述近几年cBN薄膜研究所取得的一些突破性进展后,结合研究现状提出今后可能的主要研究方向.

Cubic boron nitride （cBN） thin films, as artificially prepared materials, have excellent mechanical, thermal, electronic and optical properties, thus have potentially significant technological applications in cutting tools, high-temperature electronic devices, and protective coatings for optical elements. Cubic BN films have attracted worldwide attention since the early 1980s; however, a numbers of difficulties hindered their applications. In this paper, recent important achievements in cBN film preparation are reviewed, and perspectives for future study of cubic boron nitride film are presented.