摘要
介绍了一种用于准分子激光深层光刻实验装置的设计,并将该装置成功地应用于LIGA工艺的深层光刻中,光刻实验表明准分子激光层光刻具有很大的实用意义。
In the paper an excimer laser lithography apparatus is described.This apparatus is applied in deep lithography for LIGA process successfully.The lithography experiment result shows us that excimer lasr deep lithography is very pratical to LIGA process.
出处
《光学精密工程》
EI
CAS
CSCD
1998年第2期56-60,共5页
Optics and Precision Engineering
基金
国家攀登计划资助课题