等离子体辅助沉积HfO_2/SiO_2减反、高反光学薄膜

Deposition of HfO 2/SiO 2 antireflective and high reflective optical thin film by plasma IAD

本文报导了用等离子体辅助（Ｐｌａｓｍａ－ＩＡＤ）沉积技术沉积ＨｆＯ２／ＳｉＯ２减反及高反光学薄膜。在波长１０６４ｎｍ处，ＨｆＯ２／ＳｉＯ２减反膜透过率大于９９．５％，ＨｆＯ２／ＳｉＯ２高反膜反射率大于９９．５％。

The plasma ion assisted deposition (plasma IAD) process was applied in deposition of optical thin film which was made by alternately deposition of HfO 2 and SiO 2.At the wavelength λ=1064nm, transimittance of HfO 2/SiO 2 antireflective thin film is more than 99.5%, and the reflectivity of HfO 2/SiO 2 high reflective thin film is more than 99.5%.