高掺锡二氧化硅玻璃薄膜的制作及折射率测量

The fabrication of the high Sn-doped silica film and the measurement of its refractive index

最近研究发现掺锡的二氧化硅玻璃薄膜具有很强的光敏性,但采用化学气相沉积法制作的掺锡二氧化硅玻璃薄膜其锡含量都不高。本文报道了采用溶胶—凝胶法制作高掺锡二氧化硅薄膜(二氧化锡含量分别为75%mol和66%mol)的实验结果。并用透射光谱法测试了薄膜的折射率,测试结果表明薄膜折射率随波长的增加而减小,随着二氧化锡含量的增加而增加。

The latest study shows a high photosensitive in Sn - doped silica thin films, but the content index of Sn in Tin - doped silica is not very high by the method of Chemical Vapor Deposition （CVD） .This text reports a result of the Tin - doped silica thin films which is produced by the sol - gel （the content index of SnO2 is 75% and 66%mol）. Then the method of the transmission spectrum is brought to get the refractive index of the thin films. The test manifests that the refractive index decreasc as the increase of the wavelength and shows increase with the increase of the SnO2 content.