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热烧结及其退火工艺对玻璃衬底印刷碳纳米管薄膜场发射的影响 被引量：3

Influence of Thermal Sintering and Annealing Technics on Field Emission of Screen-printed Carbon Nanotube Films on Glass Substrate
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摘要 通过实验测试研究了热烧结和退火后处理工艺对玻璃衬底碳纳米管薄膜(CNTF)场发射特性的影响,得到了低成本丝网印刷方法在玻璃衬底制备CNTF阴极的热烧结曲线,250min热烧结过程包括2个升温阶段和3个恒温阶段,热烧结的最高温度为613K。结果表明,623K、15min是样品退火后处理的最佳条件,适宜的退火后处理使CNTF场发射趋于均匀。 In this paper, the influence of technics of thermal sintering and annealing post-treatment on the field emission property of carbon nanotuhe film（CNTF） on glass substrate is researched by test. Through the measurement, the thermal sintering curves of CNTF fabricated by screen printing method on glass substance are compared and investigated. After amelioration, the 250min thermal sintering process includes two heating-up periods and three constant temperature periods. The highest thermal sintering temperature for carbon nanotube（CNT） field emission is 613K. The result indicates that the optimum annealing temperature and time are 623K and 15min. The optimal annealing post-treatment makes the field emission of CNTF tend to become uniform.
作者 张秀霞 魏舒怡
机构地区 北方民族大学电气信息工程学院 中国科学院研究生院
出处 《材料导报》 EI CAS CSCD 北大核心 2009年第4期19-21,31,共4页 Materials Reports
基金 国家863计划项目(2001AA313090) 国家自然科学基金资助项目(60844006) 国家民委项目(08XBE07) 宁夏自然科学基金项目(NZ0884) 宁夏高等学校科学研究项目(2008JY002)
关键词 碳纳米管 丝网印刷 场致发射 热烧结 退火后处理 carbon nanotube, screen printing, field emission, thermal sintering, annealing post-treatment
分类号 TB383 [一般工业技术—材料科学与工程] TF046.4 [冶金工程—冶金物理化学]
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参考文献12

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二级参考文献11

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共引文献14

同被引文献21

  • 1魏绍东.纳米氧化锌的现状与发展[J].化工中间体,2006,2(11):6-12. 被引量：7
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  • 10Zhang Xiuxia, Zhu Changchun. Field-emission lighting tube with CNT film cathode[J]. Microelectron J, 2006,37:1358.

引证文献3

材料导报
2009年 第4期

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