摘要
A simple, economical and reliable technique is proposed for fabricating a spiral phase plate （SPP） in a quartz substrate to generate optical vortex with a unit topological charge at the wavelengths of 632.8nm. The spiral phase plate is first formed in the photoresist by direct laser writing lithography and then transferred into the quartz substrate by inductively coupled plasma etching. The performance of the fabricated SPP is verified by using beam intensity distribution, which is in agreement with the theoretical calculation result. The interference measurement suggests that we have succeeded to generate optical vortex with a unit topological charge with the fabricated SPP.
A simple, economical and reliable technique is proposed for fabricating a spiral phase plate （SPP） in a quartz substrate to generate optical vortex with a unit topological charge at the wavelengths of 632.8nm. The spiral phase plate is first formed in the photoresist by direct laser writing lithography and then transferred into the quartz substrate by inductively coupled plasma etching. The performance of the fabricated SPP is verified by using beam intensity distribution, which is in agreement with the theoretical calculation result. The interference measurement suggests that we have succeeded to generate optical vortex with a unit topological charge with the fabricated SPP.
