CVD金刚石薄膜的成核机理研究

Study on Nucleation Mechanism of CVD Diamond Films

利用热丝化学气相沉积 ,在预沉积无定形碳的硅镜面基底及表面研磨预处理的铜基底上 ,实现了金刚石薄膜的沉积 ,并由此讨论了金刚石的成核机理。研究表明 ,无定形碳是金刚石成核的前驱态 ;成核密度不仅与基底材料有关 ,更主要由基底的表面状态决定 ,基底表面状态的设计是改善成核密度的最有效的方法。

Deposition of diamond films on amorphous carbon predeposited mirror silicon and scratched copper substrate has been realized.And nucleation mechanism of CVD diamond was discussed.It showed that amorphous carbon is the precursor of diamond nucleation.Nucleation density of diamond depended more on the surface state of substrate than on substrate materials.Therefore,the design of surface state of substrate was the best way by which nucleation density can be enhanced.