MPCVD法在氧化铝陶瓷上的金刚石膜沉积及其成核分析

Investigation of Depositing Diamond Films and Nucleation on Alumina Substrates by Microwave Plasma CVD

用微波等离子体化学气相沉积 ( MPCVD)法在氧化铝陶瓷基片上沉积了金刚石薄膜。实验表明 ,对基片进行适当的预处理 ,包括用金刚石研磨膏仔细研磨和沉积前原位沉积一层无定形碳层 ,可显著提高成核密度 ;对硅衬底和氧化铝基片上金刚石膜的成核过程进行了对比分析 ,并提出了提高氧化铝基片上沉积金刚石的成核密度的措施。

Diamond films were deposited on alumina substrates by microwave plasma chemical vapor deposition (MPCVD) technique.It showed that proper pretreatments,such as polishing substrate surface carefully and in situ pre depositing an amorphous layer on the alumina substrate surface,would enhance nucleation of diamond obviously.The nucleation processes of diamond flims on alumina and Si substrates were probed contrastively.The means to enhance the nucleation of diamond on alumina substrates were put forward .