利用喷气式Z箍缩等离子体装置进行X射线光刻

EXPERIMENTAL STUDY OF X RAY LITHOGRAPHY EMPLOYING GASPUFF ZPINCH PLASMA DEVICE

喷气式Ｚ箍缩等离子体装置可以产生较强的软Ｘ射线，能量大约在２—６ｋｅＶ之间。利用此装置产生的软Ｘ射线，用ＣＳＭ作光刻胶，进行了Ｘ射线光刻的初步研究，得到了较为清晰的光刻图形。

gaspuff Zpinch plasma has been used as a soft X ray radiation source, of which the energy of the X ray ranged from 2 to 6 keV. Making use of CSM as photoresist, X ray lithography was conducted by using this plasma X ray source, and a etched pattern was obtained with 10μm in depth.