摘要
采用X射线衍射分析技术,研究了脉冲化学镀非晶态Ni-P合金的原子分布函数,得出其短程有序原子集团的尺度为0.754nm,约为熔体激冷法获得的非晶态Ni-P合金短程有序畴的1/2.并利用脉冲化学沉积非晶态合金的微观机制对这一结果进行了解释.
By means of XRD, the atomic distribution functions of amorphous Ni-P alloy prepared by im-pulse electroless wereinvestigated. The analysis of experimental results indicated that the size of short-range or-dered cluster was 0. 754nm, and was about half of that prepared by rapid-quenching. On the basis of the depositing micromechanism of amorphous alloys prepared by impulse electroless plating, the experimental results have been explained.
出处
《理化检验（物理分册）》
CAS
1998年第1期9-11,共3页
Physical Testing and Chemical Analysis(Part A:Physical Testing)
关键词
脉冲化学镀
非晶态合金
原子分布函数
镍-磷
Impulse electroless plating Amorphous alloy atomic distribution function Short-range or-dered cluster Depositing micromechanism
