纳米膜厚的量值溯源初探

Preliminary Study on Traceability of Nano Films Thickness Measurement

概述当前国内外纳米材料结构膜厚参数的计量现状，针对我国目前纳米膜厚尚未建立计量溯源体系，提出一种可实现纳米膜厚的量值溯源的途径。首先选择X射线衍射仪（XRD）作为纳米膜厚的计量标准装置，再研制带有台阶的膜厚校准样板，样板经过计量型原子力显微镜检定后，可以校准XRD，从而实现纳米膜厚的量值溯源。还对纳米膜厚校准样板的研制和XRD的计量性能进行初步探讨，为建立我国纳米膜厚测量标准和纳米膜厚测量方法标准化提供技术准备。

The present situation of the nano films thickness measurement is described. Nowadays the traceability system of nanometer films thickness measurement is still not built in China, so how to find one way to realize the traceability of nano film thickness measurement is discussed. At first, the X-ray diffractometer （XRD） is used as the standard installment to measure nano film thickness, then a special the nanometer film thickness calibration sample＇plate was developed. The sample plate can calibrate XRD after tested by the atomic force microscope which has been traced to laser wavelength. Thus the thickness value of thin films can be traced to length standard. At the same time how to design the nano film thickness calibration sample plate and how to use XRD to measure nano films also are discussed. It is the technical preparation for building standard instrument and standard testing methods for the measurement of nano film thickness.