玻璃基Ag膜层厚度与其表面形貌和性能的关系

Relation of Thickness of Ag Thin Film Deposited on Glass Substrate to Its Surface Morphology and Properties

用磁控溅射工艺在玻璃基片上沉积了银薄膜。用台阶仪、紫外可见光透射光谱、红外反射光谱、扫描电镜、光学显微镜和X射线光电子能谱研究了银膜厚度和溅射沉积气压对膜表面形貌和光学性能的影响,用四探针法测试了银膜层的方块电阻。结果表明,均匀连续和适当厚度的银膜层方块电阻小,相应膜的红外反射率和可见光透射率高;相同厚度的银膜,致密膜的方块电阻小、红外反射率高;在大气环境下,银膜层被腐蚀的机理是,不致密银膜层容易吸附氧气和硫化物,在二者吸附物的共同作用下导致在银薄膜表面出现黄色的斑点和裂纹,从而降低银膜层反射红外线的性能。

Ag thin films were deposited on float glass substrates using magnetron sputtering. The effect of the thickness of the films and sputtering pressure on the film surface morphology and optical properties were investigated by step profiling, Ultraviolet-visible spectrometry （UV-Vis）, double beam infrared spectrometry （IR）, scanning electron microscopy （SEM）, optical microscopy and X-ray photoelectron spectroscope （XPS）, the sheet resistance of the Ag films was measured using four-probe method. The obtained results show that the sheet resistance of the films of the suitable thickness is smallest when the film.is uniform and continuous, and the corresponding film shows high IR reflectivity and UV-Vis transmittance; under the same thickness, the dense Ag film shows smaller sheet resistance and larger IR reflectivity. The mechanism of oxidation of silver thin films exposed to the room temperature and atmospheric environment is as the following： 02 and small molecule gases containing S were easily first adsorbed on the surface of the loose films, and then the absorbed gases reacted with the Ag film, finally the surface of the films appears ydlow spots and crackle, which decrease the IR reflectivity of the Ag films.