Ni/AAO纳米复合薄膜的制备及其光学性能

Preparation and optical properties of Ni/AAO nano-composite thin film

采用交流电化学沉积方法,以经过阶梯降压处理的多孔氧化铝(AAO)为模板,制备出Ni/AAO纳米复合薄膜。研究了薄膜的结构及光学性能。结果表明:Ni/AAO纳米复合薄膜中Ni呈线状均匀分布在AAO纳米孔隙中,直径与AAO孔径一致,约80nm,并沿[111]方向择优生长,具有面心立方结构。光谱分析表明,该复合薄膜的光学带隙为3.18eV,较AAO模板(3.38eV)自身红移;光致发光峰位于465nm,与AAO模板相同,发光强度较模板自身减弱。

Ni/AAO nano-composite thin films were prepared by alternating current （AC） electrochemical deposition method in anodic aluminum oxide （AAO） templates processed by using step-decreased voltage. The morphology, structure and optical properties of Ni/AAO nano-composite thin films were characterized by SEM, XRD, UV-visible spectrophotometer and fluorophotometer, respectively. The results indicate that nickel nanowires with uniform distribution in Ni/AAO nano-composite thin films are about 80 nm in diameter and stabilized in face-centered cubic （fcc） structure with a preferred orientation along [ 111]. The spectral analysis shows that the optical band gap of the composite thin films has a redshift to 3.18 eV comparing with AAO template （3.38 eV）. The PL peak position of the composite thin films is at 465 nm as well as AAO template, but PL intensity decreased.