摘要
近年来随着磁控溅射技术的应用日趋广泛,对各种高纯金属及合金溅射靶材的需求量也愈来愈大。本文简要介绍了当前W和W/Ti合金靶材的应用和制备方法等,对W和W/Ti合金靶材未来的制备技术进行了展望。
Magnetron sputtering is a widely used method for thin film deposition in recent year, the demands of sputtering target materials with super high purity are greatly increased. In this paper, the application and manufacturing technology of tungsten and tungsten-titanium targets are discussed. At last, the developing tendency of the manufacturing technology of tungsten and tungsten-titanium targets is forecasted in this paper.
出处
《粉末冶金技术》
CAS
CSCD
北大核心
2009年第1期52-57,共6页
Powder Metallurgy Technology
基金
国家自然科学基金资助项目(50474012)
高等学校博士点基金资助项目(20050700002)
关键词
靶材
应用
制备技术
target
application
manufacturing technology
