电子束直写模版电沉积制备图案化磁记录介质

Preparation of Patterned Media with Electron Beam Direct-Writing Lithography and Electrodeposition

以电子束直写光刻图形为模版,采用直流电沉积和数值模拟的方法,研究了镍纳米柱阵列图案化磁记录介质的制备工艺和模版电沉积过程中的沉积不均匀问题.研究结果表明,在加速电压、曝光电流确定的条件下,电子束直写光刻模版孔径由曝光时间决定,模版的孔径和孔距在10 nm量级精确可调.在纳米孔阵列模版中进行电沉积时,适当增大孔距,降低阴极电解电势,可以减小电沉积过程中相邻孔之间的相互干扰,提高电沉积的均匀性,从而为图案化磁记录介质的电沉积制备提供了一种新的方法.

Patterned media with nickel nanopillar arrays as the magnetic recording units was prepared with electron beam direct-writing lithography and electrodeposition. The results show that the diameter of pores in the electron beam direct-writing templates is determined by the exposure time under the condition of fixed accelerating voltage and exposure current, within an adjustable range of 10 nm for pore diameters and spacings. Increasing the interval of pores in the template and lowering the cathode electrolytic potential properly can reduce the interference of adjacent pores during the electrodeposition process and hence improve the deposition uniformity.