摘要
根据目标支撑塔架的结构特点及基本性能要求,给出了一般制造工艺流程,详细论述了制造低散射塔架的完整工艺路线及具体措施,并分析了改善性能的基本原理。
Based on the structure characteristics and basic performance requirements of target support pylon, general manufacture technology process is presented. The concrete measure of target support pylon manufacture technology and whole craft course are discussed in detail and the basic law of improving performance is analyzed.
出处
《航空制造技术》
2009年第4期86-89,共4页
Aeronautical Manufacturing Technology
关键词
紧缩场
塔架
低散射
制造工艺
Compact range（CR） Pylon Lowscattering Manufacture technology
