中心螺线圈式大面积均匀金属等离子体形成方法

Method to form large area uniform metal plasmas based on central solenoid

传统的磁过滤阴极真空弧系统的金属等离子体输出面积较小且出口处的密度呈高斯分布,阻碍了等离子体浸没离子注入与沉积(PⅢ&D)技术的工业化应用,使得大面积均匀金属等离子体的产生成为了业内研究的热点。本文提出了一种基于多阴极脉冲真空弧源对称配置的中心螺线圈式大面积均匀金属等离子体形成方法,可输出直径约为600mm的金属等离子体。沉积探针结果表明:载流螺线圈对沉积均匀性有较大的影响。单源X方向的沉积均匀性优于Y方向的沉积均匀性;四弧源的离子流密度约为单源的5.5倍,沉积均匀性最高可达83.8%。

Small output and Gauss density distribution of metal plasmas at the exit of traditional filtered cathodic vacuum arc system become an obstacle of industrial application of plasma immersion ion implantation and deposition technology. Therefore, obtaining large area uniform metal plasmas is a focus of research. We have built a large area uniform metal plasmas system, with multi-cathodes installed symmetrically and a central solenoid. Metal plasmas output of 600 mm in diameter can be obtained. The results of deposition probe tests show that the presence of solenoid current has large influence on deposition uniformity. For a single source, the deposition uniformity in X-direction is better than that of Y-direction. With four sources, the ion current density is about 5.5 times more than that of a single source, and the maximum deposition uniformity is 83.8%.