摘要
用改进后的新法合成了两种新型的聚酯型光致抗蚀剂——聚5-苯基戊二烯叉丙二酸乙二酯和聚吠喃丙烯叉丙二酸乙二酯。合成方法简单,反应时间短(6~8小时)。用80瓦汞灯,距离8厘米,所需最短曝光时间分别为10秒和3秒,分辨率达到0.6微米。粘附性能好,抗蚀性强,加入染料后可用作氦氖激光全息照像记录介质。
Two new type polyester photoresists are successfully synthesized by leading two new photosensitive groups onto polyester. Poly(5-phenyl-pentadienidene ethylene glycol malonate) can be obtained by using the method which 5-phenyl-pentadienal reacts with polyethylene glycol malonate in benzene solution. Similarly polyfuranacroleinidene ethylene glycol malonate can be obtained with furanacrolein. Two products are good sensitive and act as high photosensitive and high resolution polyester photoresists in the microeleetronic industries. It is also photosensitive to the red light when it is sensitized by dye and can be used as He-Ne laser holographic recording material.
出处
《福建师范大学学报(自然科学版)》
CAS
CSCD
1989年第1期47-53,共7页
Journal of Fujian Normal University:Natural Science Edition
关键词
光致抗蚀剂
聚酯型
合成方法
polyesters, photoresists, holographic record