电弧离子镀制备Cr-O-N涂层及生长机理探讨

Preparation and investigation of the growth mechanism of Cr-O-N coating

为了弄清O2和N2的流量变化和基体负偏压对涂层微观结构的影响,利用电弧离子镀技术制备了Cr-O-N涂层,对涂层样品进行了X射线衍射分析,扫描电镜和原子力显微镜观察,电子探针成分分析,结果表明Cr-O-N涂层含CrN和Cr2O3相,衍射峰的择优取向、涂层的表面粗糙度、相含量和化学成分与制备过程中的气体流量、基体负偏压等因素密切相关:随着氧流量的增加,涂层的表面粗糙度上升,涂层中氧元素含量和Cr2O3相含量增多;基体负偏压的升高有利于涂层沿CrN(220),Cr2O3(300)面择优生长和涂层的致密性提高.

The Cr-O-N coating was deposited by arc ion plating （AIP） technique. The specimens were analyzed by X-ray diffraction （XP, D） and electron probe microanalyzer （EPMA）, and were observed by scanning electron microscope （SEM） and atomic force microscope （AFM）. The resuits indicated that there are CrN and Cr2O3 phases in the Cr-O-N coating; the preferred orientation, the surface roughness, the phase content and chemical composition of the Cr-O-N coating are dependent on the gas flow rates and the bias voltage during deposition. With the increase of O2 gas flow rate, the surface roughness, the content of oxygen and Cr2O3 phase in the coating increased; the coating became denser and grew with the preferred orientation of CrN on （220） and Cr2O3 on （300） with the enhanced bias voltage.