摘要
采用光引发剂邻氯代六芳基双咪唑、增感剂4,4-二(N,N′-二甲基-氨基)苯甲酮和供氢体N-苯基甘氨酸组成增感引发体系,研究了在高压汞灯照射下,增感体系中各组分与甲基丙烯酸甲酯光聚合速率的关系;并在此基础上初步研究了该体系在液态光致抗蚀剂中的应用。与常规的引发体系ITX/907相比,邻氯代六芳基双咪唑增感体系得到的图像线条更清晰,边缘更陡直。
The ultraviolet photosensitive initiating system is composed of bis[ 2-( o-chlorophenyl)-4, 5-diphenylimidazole] , sesitizer N, N-bis (diethylamino) benzophenone (EMK) and hydrogen donors N-phenylglycine (NPG). Under the irradiation by high pressure mercury lamp, the relationship between the photopolymerization rate of MMA and concentration of each component of the system, including BCIM, EMK, NPG and MMA was studied. The good results have been obtained in the application of the system on photoresist.
出处
《江南大学学报(自然科学版)》
CAS
2009年第1期104-107,共4页
Joural of Jiangnan University (Natural Science Edition)
基金
国家自然科学基金项目(NSFC50673038)
关键词
邻氯代六芳基双咪唑
光聚合
动力学
bis [ 2-(o-chlorophenyl) -4,5-diphenylimidazole ], photopolymerization, kinetics