终成正果贵在坚持——对CVD金刚石膜研究工作的回顾

The key to success lies in persistence——a review of the work of CVD diamond film deposition

100kW级直流等子体喷射化学气相沉积金刚石膜设备的研制成功,使我们成为继美国两家公司之后第三家能独立开发此种设备的单位,具有独创性和实用性。由于多年来的不断努力,我们不仅一直位于该项技术领域的前沿,而且也取得了很好的市场效果。金刚石膜制备工作因贵在坚持而终成正果。通过忆往昔,看今朝,思明日,对以往工作的简单回顾,来纪念院庆30周年。

The successful development of 100kw DC arc plasma jet chemical vapor deposition （PJCVD） equipment in 1996 made our comPanY the third one who can exploit independently in the world follow- ing two United States companies. OUr PJCVD equipment possesses originality and practicability. Owing to constant efforts in the past years, we always keep a leading position in the field of artificial diamond industry and achieve great economic effects. There is a saying that the key to success lies in persistence. The successful development of CVD diamond film deposition profited from carrying on the saying. Let us retrospect the past, focus on today and expect the future. This simple review of our works on CVD diamond film deposition was made in order to commemorate the 30^th anniverary of Hebei academy of science and technology.