二元分层动态靶溅射的Monte Carlo模拟计算

MONTE CARLO SIMULATION OF SPUTTERING OF TWO-COMPONENT MULTI-LAYER DYNAMIC TARGETS

本文介绍一个二元分层动态靶溅射的Monte Carlo模拟程序,包括工作原理、物理模型、程序设计和适用范围等。本程序采用二体碰撞近似描述原子间的散射过程,所用作用势为Molière近似的Thomas—Fermi势,并且根据需要可调节每薄层厚度及靶成分。 该程序可计算几百eV～MeV离子轰击二元无定型靶的溅射产额,从而研究固体靶的择优溅射、溅射能谱、角分布及深度来源分布等。文中给出一些计算结果。

A Monte Carlo computer program simulating the sputtering of two -component multi -layer dynamic target is presented, including principle, physical models, program design and applicability. The atomic scattering is governed by the Moliere approximation to the Thomas-Fermi potential and is evaluated with the binary-collision approximation. The target is treated in slab geometry, and the thickencss and the target composition of each slab can be rearranged during sputtering.This program can be used to calculate sputtering yields of two -component amorphous target and, therefore, to study preferential sputtering, energy and angular distributions of sputtered species as well as the depth of origin of the sputtered particles in solid target. Some calculation results are given in this paper.