硅多层微机械结构无掩模腐蚀新技术及在力敏结构制作中的应用

A Novel Maskless Etching Technology for Silicon MultiLevel MicroStructure and Applications on Mechanical Sensor Structures

提出一种新型硅无掩模腐蚀技术。利用设计一块掩模和进行一次常规有掩模腐蚀之后的无掩模腐蚀工艺，可制作多层次的硅微机械结构，结构层数原则上不受限制，各层次的位置和相应深度方便可控。基于该技术，给出了制作的几例多层力学量传感器结构结果。该技术将可望广泛应用于半导体微机械传感器和执行器中。

This paper presens a novel maskless etching technology for fabrication of multilevel silicon micromachining structures.Various kinds of structures can be formed by using only one mask and a maskless following masked etching process.The technology has been successfully used in mechanical microsensor structures including singlesi ded multilevel pressure sensor,symmetric beammass structure capacitive accelerometer and integrated multiscale mechanical array,etc.