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基于微带环缝谐振器的小功率微波等离子体源 被引量:2

Study on Low-Power Microwave Plasma Source Based on Microstrip Split-Ring Resonator
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摘要 介绍了一种基于微带环缝谐振器的2.45 GHz小功率微波等离子体源,根据微带环缝谐振器的奇模等效电路,通过S参数与微波等离子体阻抗之间的关系,研究小功率微波等离子体源的阻抗匹配及其在不同气体条件下的放电规律.研究表明,在低气压(空气)和常压(氩气)条件下,输入功率不超过1 W,都能使气体放电并激励起稳定的微波等离子体;当微波等离子体激励以后,小功率微波等离子体源的谐振频率和S参数发生变化.这些为小功率电容耦合微波等离子体源的小型化研究提供了理论基础. A low-power microwave plasma source based on microstrip split-ring resonator at 2.45 GHz was presented. The impedance matching of low power microwave plasma source was analyzed based on odd mode equivalent circuit and the interrelation between S parameter and microwave plasma impedance, and the discharges in various gas pressure were studied. The research shows that air plasma is ignited in low pressure and Ar plasma is ignited in atmospheric pressure as the input power is less than 1 W. The resonant frequency and S parameter of low power microwave plasma source change with the excitation of microwave plasma. This may be a theoretical guidance for miniaturization of capacitively-coupled microwave plasma source.
出处 《上海交通大学学报》 EI CAS CSCD 北大核心 2009年第3期372-376,共5页 Journal of Shanghai Jiaotong University
基金 国家自然科学基金资助项目(60471015)
关键词 微带环缝谐振器 小功率微波等离子体源 阻抗匹配 气体放电 S参数 microstrip split-ring resonator low power microwave plasma source impedance matching gasdischarge S parameter
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参考文献7

  • 1Iza F, Hopwood J A. Low-power microwave plasma source based on a mierostrip split-ring resonator[J]. IEEE Transactions on Plasma Science, 2003, 31 (4) : 782-787.
  • 2Hopwood J. A mierofabricated inductively-coupled plasma generator[J]. Journal of Microelectromeehanical Systems, 2000, 9(3): 309-313.
  • 3Bilgic A M, Engel U, Voges E, et al. A new lowpower microwave plasma source using mierostrip technology for atomic emission spectrometry [J]. Plasma Sources Sei Teehnol, 2000, 9(1): 1-4.
  • 4Bilgic A M, Voges E. A low-power 2.45 GHz microwave induced helium plasma source at atmospheric pressure based on microstrip technology[J]. J Anal Atomic Spectrometry, 2000, 15(6): 579-580.
  • 5Iza F, Hopwood J. Split-ring resonator microplasma: Microwave model, plasma impedance and power efficiency[J]. Plasma Sources Sei Teehnoi, 2005, 14(2) : 397-406.
  • 6Lieberman M A, Lichtenberg A J. Principle of plasma discharges and materials processing[M]. New York: Wiley, 1994.
  • 7廖斌,张少君,朱守正.基于微带环缝谐振器的2.45GHz小功率微波等离子体源的建模与仿真[J].电子与信息学报,2007,29(10):2512-2516. 被引量:4

二级参考文献4

  • 1Bilgic A M, Engel U, Voges E, Kuckelheim M, and Broekaert J A C. A new low-power microwave plasma source using microstrip technology for atomic emission spectrometry[J], Plasma Sources Sci. Technol., 2000, 9(1): 1-4.
  • 2Iza F and Hopwood J A. Low-power microwave plasma source based on a microstrip split-ring resonator[J]. IEEE Trans. on Plasma Science, 2003, 31(4): 782-787.
  • 3Bilgic A M, Voges E, Engel U, and Broekaert J A C. A low-power 2.45GHz microwave induced helium plasma source at atmospheric pressure based on microstrip technology[J], J. Anal. Atomic Spectrometry, 2000, 15(6): 579-580.
  • 4Iza F and Hopwood J. Split-ring resonator microplasma:microwave model, plasma impedance and power efficiency [J]. Plasma Sources Sci. Technol., 2005, 14(2): 397-406.

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